• Journal Article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data II. Morphology and composition as a function of deposition parameters

Citation

Soman, R., Reisman, A., Temple, D., Alberti, R., & Pace, C. (2000). Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data II. Morphology and composition as a function of deposition parameters. Journal of the Electrochemical Society, 147(5), 1854-1858.

Abstract