• Article

Planarization processes and applications III. As-deposited and annealed film properties

Citation

Croswell, RT., Reisman, A., Simpson, DL., Temple, D., & Williams, CK. (2000). Planarization processes and applications III. As-deposited and annealed film properties. Journal of the Electrochemical Society, 147(4), 1513-1524.