• Journal Article

Stress evolution as a function of substrate bias in rf magnetron sputtered yttria-stabilized zirconia films

Citation

Piascik, J., Thompson, J. Y., Bower, C., & Stoner, B. (2006). Stress evolution as a function of substrate bias in rf magnetron sputtered yttria-stabilized zirconia films. Journal of Vacuum Science & Technology A, 24(4), 1091-1095.

Abstract