Method for protecting a substrate surface from contamination using the photophoretic effect
Citation
Periasamy, R. (1994). IPC No. U.S.Method for protecting a substrate surface from contamination using the photophoretic effect (Patent No. 5366559.)
Abstract
A method for processing a substrate surface in a process chamber wherein during chemical or physical altering of the substrate surface a laser beam is projected inside the processing chamber and along a trajectory which does not contact the substrate surface in order to capture particles by means of the photophoretic effect, particles which would otherwise impinge upon and contaminate the substrate surface.