A method for processing a substrate surface in a process chamberwherein during chemical or physical altering of the substratesurface a laser beam is projected inside the processing chamber andalong a trajectory which does not contact the substrate surface inorder to capture particles by means of the photophoretic effect,particles which would otherwise impinge upon and contaminate thesubstrate surface.
Method for protecting a substrate surface from contamination using the photophoretic effect
Periasamy, R. (1994). IPC No. U.S. Method for protecting a substrate surface from contamination using the photophoretic effect. (U.S. Patent No. 5366559).
Abstract
Abstract
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