RTI uses cookies to offer you the best experience online. By clicking “accept” on this website, you opt in and you agree to the use of cookies. If you would like to know more about how RTI uses cookies and how to manage them please view our Privacy Policy here. You can “opt out” or change your mind by visiting: http://optout.aboutads.info/. Click “accept” to agree.

Method for protecting a substrate surface from contamination using the photophoretic effect

Periasamy, R. (1994). Method for protecting a substrate surface from contamination using the photophoretic effect. (U.S. Patent No. 5366559). http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=5366559

Abstract

A method for processing a substrate surface in a process chamber wherein during chemical or physical altering of the substrate surface a laser beam is projected inside the processing chamber and along a trajectory which does not contact the substrate surface in order to capture particles by means of the photophoretic effect, particles which would otherwise impinge upon and contaminate the substrate surface.

Publications Info

To contact an RTI author, request a report, or for additional information about publications by our experts, send us your request.

Recent Publications

Article

Developing capacity in identifying cost-effective interventions to prevent and reduce obesity in China
Article

US consumer and healthcare professional preferences for combination COVID-19 and influenza vaccines
Article

Comparing youth-friendly clinics to the standard of care for adolescent girls and young women in Malawi: A qualitative analysis
Article

Patient-reported outcome improvements following scalp hair regrowth among patients with Alopecia Areata: analysis of the ALLEGRO-2b/3 trial