Method for protecting a substrate surface from contamination using the photophoretic effect
A method for processing a substrate surface in a process chamberwherein during chemical or physical altering of the substratesurface a laser beam is projected inside the processing chamber andalong a trajectory which does not contact the substrate surface inorder to capture particles by means of the photophoretic effect,particles which would otherwise impinge upon and contaminate thesubstrate surface.
Citation
Periasamy, R. (1994). IPC No. U.S.Method for protecting a substrate surface from contamination using the photophoretic effect (Patent No. 5366559.)