• Journal Article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis I. The system Si-Ge-Cl-H

Citation

Soman, R., Reisman, A., & Temple, D. (2000). Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis I. The system Si-Ge-Cl-H. Journal of the Electrochemical Society, 147(11), 4333-4341.

Abstract