• Journal Article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis II. The system Si-Ge-Cl-H-Ar

Citation

Soman, R., Reisman, A., & Temple, D. (2000). Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis II. The system Si-Ge-Cl-H-Ar. Journal of the Electrochemical Society, 147(11), 4342-4344.

Abstract