• Journal Article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data I. Deposition parameters

Citation

Soman, R., Reisman, A., Temple, D., & Alberti, R. (2000). Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data I. Deposition parameters. Journal of the Electrochemical Society, 147(5), 1847-1853.

Abstract