• Journal Article

Postgrowth In Situ Chlorine Passivation for Suppressing Surface-Dominant Transport in Silicon Nanowire Devices

Citation

Kim, J-Y., Kwon, M-K., logeeswaran, V., Grego, S., & Islam, M. S. (2012). Postgrowth In Situ Chlorine Passivation for Suppressing Surface-Dominant Transport in Silicon Nanowire Devices. IEEE Transactions on Nanotechnology, 11, 782 - 787.

Abstract