• Journal Article

Mechanical-Stress in Sio2-Films Obtained by Remote Plasma-Enhanced Chemical Vapor-Deposition

Citation

Temple, D., Reisman, A., Fountain, G., Walters, M., & Hattangady, S. V. (1993). Mechanical-Stress in Sio2-Films Obtained by Remote Plasma-Enhanced Chemical Vapor-Deposition. Journal of the Electrochemical Society, 140(2), 564-567.

Abstract