• Journal Article

Formation of Aluminum-Oxide Films from Aluminum Hexafluoroacetylacetonate at 350-450-Degrees C

Citation

Temple, D., & Reisman, A. (1990). Formation of Aluminum-Oxide Films from Aluminum Hexafluoroacetylacetonate at 350-450-Degrees C. Journal of Electronic Materials, 19(9), 995-1002.

Abstract