• Journal Article

Effects of deposition parameters on the electrical and mechanical properties of indium tin oxide films on polyethylene napthalate substrates deposited by radio frequency magnetron sputtering

Citation

Bhagat, S. K., Han, H., Zoo, Y., Lewis, J., Grego, S., Lee, K., ... Alford, T. L. (2008). Effects of deposition parameters on the electrical and mechanical properties of indium tin oxide films on polyethylene napthalate substrates deposited by radio frequency magnetron sputtering. Thin Solid Films, 516(12), 4064-4069. DOI: 10.1016/j.tsf.2007.12.146

Abstract

The mechanical and electrical properties of indium tin oxide films on polyethylene naphthalate substrates are critical to the development of flexible displays. In the present study, mechanical and electrical properties are studied as a function of processing conditions, including radio frequency (rf) power, substrate temperature, and substrate plasma treatment. The results show that substrate temperature has the largest impact on mechanical performance. The best electrical performance is obtained from high substrate temperature and high rf power, while the best mechanical performance is obtained from high substrate temperature and low rf power. Plasma treatment gases influence electrical and mechanical properties, with mixture of nitrogen and hydrogen gases producing the best results. This work provides better initial understanding of the relationship between sputter process conditions and film properties and their influence on electrical and mechanical performance.