Destruction of volatile organic compounds used in a semiconductor industry by a capillary tube discharge reactor
Kohno, H., Berezin, A. A., Chang, J. S., Tamura, M., Yamamoto, T., Shibuya, A., & Hondo, S. (1998). Destruction of volatile organic compounds used in a semiconductor industry by a capillary tube discharge reactor. IEEE Transactions on Industry Applications, 34(5), 953-966. DOI: 10.1109/28.720435
Nonthermal plasma technologies offer an innovative approach to the problem of decomposing various volatile organic compounds (VOCs). The authors focused on DC capillary tube discharge plasma reactors to study the decomposition/destruction efficiency for toluene, EGM, trichloroethane and trichloroethylene at 50-2300 ppm levels in dry air. The effects of gas flow rate, VOC concentration and reactor operating conditions on decomposition and analysis of reactant conversion for each VOC were investigated. The results show that VOC destruction efficiency as high as 90% can be achieved, even under a short residence time (3.8 ms) with a destruction energy efficiency of up to 95 g (VOC)/kWh. Laboratory-scale plasma technology was successfully demonstrated for its potential application for VOC control in the semiconductor clean-room environment.