• Patent

Apparatus and method for uniformly coating a substrate in an evacuable chamber

Citation

Donovan, R. P., Periasamy, R., Clayton, A., & Ensor, D. (1993). IPC No. U.S.Apparatus and method for uniformly coating a substrate in an evacuable chamber (Patent No. 5229171.)

Abstract

An apparatus and method including a droplet coating generator for generating a stream of electrically charged coating droplets within an evacuable chamber towards a substrate positioned within the evacuable chamber. A piezoelectric vibrator and orifice plate coupled thereto generate the stream of coating droplets. The coating droplets are urged to move in a sweeping motion across the substrate by at least one pair of opposing spaced apart electrodes powered by an electrical power supply. A uniform coating is thus produced while the evacuable chamber is maintained at subatmospheric pressure as required during typical semiconductor processing. Multiple applications of a photoresist coating may be applied by the coating apparatus without requiring that the evacuable chamber be repeatedly vented and pumped down to subatmospheric pressure.