Mechanical-Stress in Sio2-Films Obtained by Remote Plasma-Enhanced Chemical Vapor-Deposition

Dorota S. Temple; Dorota S. Temple; Arnold Reisman; G Fountain; M Walters; SV Hattangady

Mechanical-Stress in Sio2-Films Obtained by Remote Plasma-Enhanced Chemical Vapor-Deposition

Temple, D., Reisman, A., Fountain, G., Walters, M., & Hattangady, SV. (1993). Mechanical-Stress in Sio2-Films Obtained by Remote Plasma-Enhanced Chemical Vapor-Deposition. Journal of the Electrochemical Society, 140(2), 564-567.

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