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Transmission electron microscopy study of the structure of radio frequency sputter-deposited yttria-stabilized zirconia thin films

Transmission electron microscopy (TEM) was used to investigate the structural properties of sputter-deposited yttria-stabilized zirconia (YSZ) thin films. YSZ films were deposited over a range of temperatures and background oxygen levels. Additionally, a multilayered structure was produced by cyclic application of a substrate bias. Plan-view TEM showed that temperature and oxygen levels did not have a significant effect on grain size but did alter the phases present in the thin films. Cross-sectional TEM showed the development of texture in the multilayer film, both within the individual layers and in the entire film.

Citation

Ruddell, D. E., Stoner, B., & Thompson, J. Y. (2003). Transmission electron microscopy study of the structure of radio frequency sputter-deposited yttria-stabilized zirconia thin films. Journal of Materials Research, 18(1), 195-200. https://doi.org/10.1557/JMR.2003.0027

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