• Journal Article

Selective Epitaxial-Growth of Silicon by the Ac Technique .1. Nonimplanted Substrate/Oxide Surfaces

Citation

Wang, Q. S., Reisman, A., Temple, D., & Alberti, R. (1995). Selective Epitaxial-Growth of Silicon by the Ac Technique .1. Nonimplanted Substrate/Oxide Surfaces. Journal of the Electrochemical Society, 142(7), 2438-2449.

Abstract