• Journal Article

Effect of film chemistry on refractive index of plasma-enhanced chemical vapor deposited silicon oxynitride films: A correlative study

Citation

Naskar, S., Wolter, S. D., Bower, C., Stoner, B., & Glass, J. T. (2008). Effect of film chemistry on refractive index of plasma-enhanced chemical vapor deposited silicon oxynitride films: A correlative study. Journal of Materials Research, 23(5), 1433-1442.

Abstract