Distribution of polymer deposition in plasma polymerization. I. Acetylene, ethylene and the effect of carrier gas
Factors which influence the distribution of polymer deposition in an electrodeless glow-discharge system were investigated for acetylene and ethylene. Under the conditions in which “full glow” is maintained, the distribution of polymer deposition from pure monomer flow systems is nearly independent of flow rate of monomer or of the system pressure in discharge, but is largely determined by the characteristic (absolute) polymerization rates (not deposition rate) of the monomers. Acetylene has a high tendency to deposit polymer near the monomer inlet, whereas ethylene deposits polymer more uniformly in wider areas in the reactor. The addition of carrier gas such as argon or partially copolymerizing gas such as N2, H2, and CCl2F2 was found to narrow the distribution of polymer deposition. The distribution of polymer deposition is also influenced by a glow characteristic which is dependent on flow rate and discharge power.
Yasuda, H., & Hirotsu, T. (1978). Distribution of polymer deposition in plasma polymerization. I. Acetylene, ethylene and the effect of carrier gas. Journal of Polymer Science Part A-Polymer Chemistry, 16(1), 229-241. DOI: 10.1002/pol.1978.170160122