| Title: | Plasma processing system and method |
| Patent No.: | 7112536 |
| Type: | Patent |
| Date: | 2006 |
| Authors: | Markunas, R.J., Fountain, G.G., Hendry, R.C. |
| Abstract: | A plasma processing system and method wherein a power source
produces a magnetic field and an electric field, and a window
disposed between the power source and an interior of a plasma
chamber couples the magnetic field into the plasma chamber thereby
to couple power inductively into the chamber and based thereon
produce a plasma in the plasma chamber. The window can be shaped
and dimensioned to control an amount of power capacitively coupled
to the plasma chamber by means of the electric field so that the
amount of capacitively coupled power is selected in a range from
zero to a predetermined amount. Also, a tuned antenna strap having
r.f. power applied thereto to produce a standing wave therein can
be arranged adjacent the window to couple magnetic field from a
current maximum formed in the strap to the interior of the chamber.
A desired amount of magnetic field and/or electric field coupling
can be produced by arrangement of the chamber window adjacent that
portion of the antenna strap exhibiting the desired current/voltage
relationship. The system may be formed in a line source
configuration, or in a cylindrical source configuration. The window
may have slots and/or apertures, the size and shape of which may be
variable. |
| Online Resources: | Patent Details (US PTO) |
| Full Citation: | Markunas, R.J., Fountain, G.G., & Hendry, R.C. (2006). Plasma processing system and method. U.S. Patent No. 7,112,536. Washington, D.C.: U.S. Patent and Trademark Office |
