Microanalysis and Microscopy: Capabilities
Spectral Ellipsometry
The ellipsometer uses a variable-wavelength light source to reflect light off thin-filmed samples to determine information about the thickness of those films and their optical properties. It can also measure such features as stacked layers within thin films, film roughness, and film porosity. Like XPS, it is a non-destructive technique that has many applications in the semiconductor industry.
Contact: Michael Lamvik